Materials Design Considerations for Future Lithographic Technologies.
نویسندگان
چکیده
منابع مشابه
Novel Design Methods for High-quality Lithographic Objectives Novel Design Methods for High-quality Lithographic Objectives
Celor doua Doamne din viata mea: mamaie si mama 7 Preface This thesis discusses some of the challenges of optical design for Extreme Ultraviolet (EUV) mirror systems and illustrates novel design techniques and their application to, preponderantly, EUV systems and, in addition, some Deep Ultraviolet (DUV) lithographic objectives. The main added value of this thesis is the fact that it shows how ...
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ژورنال
عنوان ژورنال: Journal of Photopolymer Science and Technology
سال: 1995
ISSN: 0914-9244,1349-6336
DOI: 10.2494/photopolymer.8.709